Methods employed in optical emission spectroscopy analysis: a review

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dc.citation.epage267
dc.citation.issue21
dc.citation.journalAbbreviatedTitleing.cienc.
dc.citation.journalTitleIngeniería y Ciencia
dc.citation.spage239
dc.citation.volume11
dc.contributor.affiliationUniversidad Nacional de Colombiaspa
dc.contributor.authorDevia, D. M.spa
dc.contributor.authorRodriguez-Restrepo, L. V.spa
dc.contributor.authorRestrepo-Parra, E.spa
dc.date2014-12-19
dc.date.accessioned2015-05-06T15:16:01Z
dc.date.available2015-05-06T15:16:01Z
dc.date.issued2014-12-19
dc.descriptionIn this work, different methods employed for the analysis of emission spectra are presented -- The proposal is to calculate the excitation temperature (Texc), electronic temperature (Te) and electron density (ne) for several plasma techniques used in the growth of thin films -- Some of these techniques include magnetron sputtering and arc discharges -- Initially, some fundamental physical principles that support the Optical Emission Spectroscopy (OES) technique are described; then, some rules to consider during the spectral analysis to avoid ambiguities are listed -- Finally, some of the more frequently used spectroscopic methods for determining the physical properties of plasma are described
dc.formatapplication/pdf
dc.identifier.doi10.17230/ingciencia.11.21.12
dc.identifier.eissn2256-4314
dc.identifier.issn1794–9165
dc.identifier.urihttp://hdl.handle.net/10784/5300
dc.language.isoengeng
dc.publisherUniversidad EAFITspa
dc.relation.ispartofIngeniería y Ciencia - ing.cienc.; Vol. 11, Núm. 21 (2015): 10 años; 239-267spa
dc.relation.isversionofhttp://publicaciones.eafit.edu.co/index.php/ingciencia/article/view/2459
dc.relation.urihttp://publicaciones.eafit.edu.co/index.php/ingciencia/article/view/2459
dc.rightsCopyright (c) 2015 Ingeniería y Ciencia – ing.cienc.spa
dc.rightshttp://creativecommons.org/licenses/by/4.0spa
dc.rights.accessrightsinfo:eu-repo/semantics/openAccesseng
dc.rights.localAcceso abiertospa
dc.sourceIngeniería y Ciencia - ing.cienc.; Vol. 11, Núm. 21 (2015): 10 años; 239-267spa
dc.sourceinstname:Universidad EAFITspa
dc.sourcereponame:Repositorio Institucional Universidad EAFITspa
dc.subject.keywordEmission spectroscopy
dc.subject.keywordSpectrum analysis
dc.subject.keywordPlasma spectroscopy
dc.subject.keywordSpectrum analysis
dc.subject.keywordThin films
dc.subject.lembESPECTROSCOPIA DE EMISIÓN
dc.subject.lembANÁLISIS ESPECTRAL
dc.subject.lembESPECTROSCOPIA DE PLASMA
dc.subject.lembANÁLISIS ESPECTRAL
dc.subject.lembPELÍCULAS DELGADAS
dc.titleMethods employed in optical emission spectroscopy analysis: a revieweng
dc.typeinfo:eu-repo/semantics/publishedVersioneng
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:eu-repo/semantics/article
dc.typearticleeng
dc.type.localArtículospa

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