Methods employed in optical emission spectroscopy analysis: a review
Fecha
2014-12-19
Autores
Devia, D. M.
Rodriguez-Restrepo, L. V.
Restrepo-Parra, E.
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Título de la revista
ISSN de la revista
1794–9165
Título del volumen
Editor
Universidad EAFIT
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Resumen
Descripción
In this work, different methods employed for the analysis of emission spectra are presented -- The proposal is to calculate the excitation temperature (Texc), electronic temperature (Te) and electron density (ne) for several plasma techniques used in the growth of thin films -- Some of these techniques include magnetron sputtering and arc discharges -- Initially, some fundamental physical principles that support the Optical Emission Spectroscopy (OES) technique are described; then, some rules to consider during the spectral analysis to avoid ambiguities are listed -- Finally, some of the more frequently used spectroscopic methods for determining the physical properties of plasma are described