Comparative studies of the feed gas composition effects on the characteristics of DLC films deposited by magnetron sputtering
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2004-07-01
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ELSEVIER SCIENCE SA
Resumen
Mixtures of acetylene/argon and methane/argon with different volume percents of hydrocarbon were used as the precursor gas to grow DLC films, keeping constant the other process parameters. The substrates used were p-type (100) silicon wafers. The films were characterized by Raman spectroscopy, nanoindentation, atomic force microscopy (AFM) and by a profilometer. In order to grow DLC films with special properties that could make this material an alternative candidate for applications in micro-electromechanical systems (MEMS) production, a comparative analysis focused on the influence of the hydrocarbon precursor gas mixture on the mechanical and chemical properties of the DLC films is reported. © 2004 Elsevier B.V. All rights reserved.