2015-05-062014-12-191794–9165http://hdl.handle.net/10784/5300In this work, different methods employed for the analysis of emission spectra are presented -- The proposal is to calculate the excitation temperature (Texc), electronic temperature (Te) and electron density (ne) for several plasma techniques used in the growth of thin films -- Some of these techniques include magnetron sputtering and arc discharges -- Initially, some fundamental physical principles that support the Optical Emission Spectroscopy (OES) technique are described; then, some rules to consider during the spectral analysis to avoid ambiguities are listed -- Finally, some of the more frequently used spectroscopic methods for determining the physical properties of plasma are describedapplication/pdfengCopyright (c) 2015 Ingeniería y Ciencia – ing.cienc.http://creativecommons.org/licenses/by/4.0info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/openAccessESPECTROSCOPIA DE EMISIÓNANÁLISIS ESPECTRALESPECTROSCOPIA DE PLASMAANÁLISIS ESPECTRALPELÍCULAS DELGADASEmission spectroscopySpectrum analysisPlasma spectroscopySpectrum analysisThin filmsAcceso abierto2015-05-06Devia, D. M.Rodriguez-Restrepo, L. V.Restrepo-Parra, E.10.17230/ingciencia.11.21.122256-4314