2021-03-232004-07-01406090WOS;000222217100064SCOPUS;2-s2.0-2942534389http://hdl.handle.net/10784/27135Mixtures of acetylene/argon and methane/argon with different volume percents of hydrocarbon were used as the precursor gas to grow DLC films, keeping constant the other process parameters. The substrates used were p-type (100) silicon wafers. The films were characterized by Raman spectroscopy, nanoindentation, atomic force microscopy (AFM) and by a profilometer. In order to grow DLC films with special properties that could make this material an alternative candidate for applications in micro-electromechanical systems (MEMS) production, a comparative analysis focused on the influence of the hydrocarbon precursor gas mixture on the mechanical and chemical properties of the DLC films is reported. © 2004 Elsevier B.V. All rights reserved.enghttps://v2.sherpa.ac.uk/id/publication/issn/0040-6090info:eu-repo/semantics/conferencePaperAcetyleneArgonAtomic force microscopyComposition effectsIndentationMagnetron sputteringMethaneMicroelectromechanical devicesProfilometryRaman spectroscopySputter depositiongas dischargeSilicon substratesDiamond like carbon films2021-03-23Libardi, J.Grigorov, K.Massi, M.Otani, C.Ravagnani, S.P.Maciel, H.S.Guerino, M.Ocampo, J.M.J.10.1016/j.tsf.2003.12.131