Performance characterization of an xy-stage applied to micrometric laser direct writing lithography

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dc.citation.journalTitleSensors
dc.contributor.authorJaramillo J
dc.contributor.authorZarzycki A
dc.contributor.authorGaleano J
dc.contributor.authorSandoz P
dc.contributor.departmentUniversidad EAFIT. Departamento de Ciencias Básicas
dc.contributor.researchgroupElectromagnetismo Aplicado (Gema)spa
dc.date.accessioned2021-03-23T21:39:33Z
dc.date.available2021-03-23T21:39:33Z
dc.date.issued2017-02-01
dc.description.abstractThis article concerns the characterization of the stability and performance of a motorized stage used in laser direct writing lithography. The system was built from commercial components and commanded by G-code. Measurements use a pseudo-periodic-pattern (PPP) observed by a camera and image processing is based on Fourier transform and phase measurement methods. The results report that the built system has a stability against vibrations determined by peak-valley deviations of 65 nm and 26 nm in the x and y directions, respectively, with a standard deviation of 10 nm in both directions. When the xy-stage is in movement, it works with a resolution of 0.36 µm, which is an acceptable value for most of research and development (R and D) microtechnology developments in which the typical feature size used is in the micrometer range. © 2017 by the authors; licensee MDPI, Basel, Switzerland.eng
dc.identifierhttps://eafit.fundanetsuite.com/Publicaciones/ProdCientif/PublicacionFrw.aspx?id=6261
dc.identifier.doi10.3390/s17020278
dc.identifier.issn14248220spa
dc.identifier.otherWOS;000395482700062
dc.identifier.otherPUBMED;28146126
dc.identifier.otherSCOPUS;2-s2.0-85011662546
dc.identifier.urihttp://hdl.handle.net/10784/27171
dc.language.isoengeng
dc.publisherMDPI AG
dc.relation.urihttps://www.scopus.com/inward/record.uri?eid=2-s2.0-85011662546&doi=10.3390%2fs17020278&partnerID=40&md5=5096edbe32fc296b8b8268928bae6caf
dc.rightshttps://v2.sherpa.ac.uk/id/publication/issn/1424-8220
dc.sourceSensors
dc.subject.keywordImage processingeng
dc.subject.keywordMicrofabricationeng
dc.subject.keywordPhase measurementeng
dc.subject.keywordPhotolithographyeng
dc.subject.keywordCommercial componentseng
dc.subject.keywordG codeseng
dc.subject.keywordHigh resolutioneng
dc.subject.keywordLaser direct writingeng
dc.subject.keywordMeasurement methodseng
dc.subject.keywordPerformance characterizationeng
dc.subject.keywordResearch and developmenteng
dc.subject.keywordXY stageeng
dc.subject.keywordOptical waveguideseng
dc.titlePerformance characterization of an xy-stage applied to micrometric laser direct writing lithographyeng
dc.typearticleeng
dc.typeinfo:eu-repo/semantics/articleeng
dc.typeinfo:eu-repo/semantics/publishedVersioneng
dc.typepublishedVersioneng
dc.type.localArtículospa

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