Synthesis of Alumina Thin Films Using Reactive Magnetron Sputtering Method

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dc.contributor.authorAngarita G.
dc.contributor.authorPalacio C.
dc.contributor.authorTrujillo M.
dc.contributor.authorArroyave M.
dc.contributor.departmentUniversidad EAFIT. Departamento de Cienciasspa
dc.contributor.researchgroupElectromagnetismo Aplicado (Gema)spa
dc.creatorAngarita G.
dc.creatorPalacio C.
dc.creatorTrujillo M.
dc.creatorArroyave M.
dc.date.accessioned2021-03-23T21:39:09Z
dc.date.available2021-03-23T21:39:09Z
dc.date.issued2017-06-13
dc.description.abstractAlumina (Al2O3) thin films were deposited on Si (100) by Magnetron Sputtering in reactive conditions between an aluminium target and oxygen 99.99% pure. The plasma was formed employing Argon with an R.F power of 100 W, the dwelling time was 3 hours. 4 samples were produced with temperatures between 350 and 400 °C in the substrate by using an oxygen flow of 2 and 8 sccm, the remaining parameters of the process were fixed. The coatings and substrates were characterized using Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM), X-ray diffraction (XRD) and Energy Dispersive Spectroscopy (EDS) in order to compare their properties before and after deposition. The films thicknesses were between 47 and 70 nm. The results show that at high oxygen flow the alumina structure prevails in the coatings while at lower oxygen flow only aluminum is deposited in the coatings. It was shown that the temperature increases grain size and roughness while decreasing the thicknesses of the coatings. © Published under licence by IOP Publishing Ltd.eng
dc.identifierhttps://eafit.fundanetsuite.com/Publicaciones/ProdCientif/PublicacionFrw.aspx?id=6868
dc.identifier.doi10.1088/1742-6596/850/1/012022
dc.identifier.issn17426596
dc.identifier.otherWOS;000437878400022
dc.identifier.otherSCOPUS;2-s2.0-85021958651
dc.identifier.urihttp://hdl.handle.net/10784/27144
dc.language.isoengeng
dc.publisherIOP PUBLISHING LTD
dc.relation.urihttps://www.scopus.com/inward/record.uri?eid=2-s2.0-85021958651&doi=10.1088%2f1742-6596%2f850%2f1%2f012022&partnerID=40&md5=1eca93ebc9009780622f79475917ba38
dc.rightshttps://v2.sherpa.ac.uk/id/publication/issn/1742-6596
dc.sourceJournal Of Physics: Conference Series
dc.subject.keywordAluminaeng
dc.subject.keywordAluminumeng
dc.subject.keywordAtomic force microscopyeng
dc.subject.keywordCoatingseng
dc.subject.keywordEnergy dispersive spectroscopyeng
dc.subject.keywordMagnetron sputteringeng
dc.subject.keywordMagnetronseng
dc.subject.keywordOxygeneng
dc.subject.keywordScanning electron microscopyeng
dc.subject.keywordSubstrateseng
dc.subject.keywordThin filmseng
dc.subject.keywordX ray diffractioneng
dc.subject.keywordAlumina structureeng
dc.subject.keywordAlumina thin filmseng
dc.subject.keywordDwelling timeeng
dc.subject.keywordEnergy dispersive spectroscopies (EDS)eng
dc.subject.keywordHigh oxygenseng
dc.subject.keywordReactive conditioneng
dc.subject.keywordReactive magnetron sputtering methodeng
dc.subject.keywordTemperature increaseeng
dc.subject.keywordAluminum coatingseng
dc.titleSynthesis of Alumina Thin Films Using Reactive Magnetron Sputtering Methodeng
dc.typeinfo:eu-repo/semantics/conferencePapereng
dc.typeconferencePapereng
dc.typeinfo:eu-repo/semantics/publishedVersioneng
dc.typepublishedVersioneng
dc.type.localDocumento de conferenciaspa

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