Documento de conferencia (Gema)

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https://hdl.handle.net/10784/2868

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Examinando Documento de conferencia (Gema) por Autor "Arroyave M."

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    Study of the suitability of a commercial hydroxyapatite powder to obtain sintered compacts for medical applications
    (IOP PUBLISHING LTD, 2017-06-13) Palacio C.; Jaramillo D.; Correa S.; Arroyave M.; Palacio C.; Jaramillo D.; Correa S.; Arroyave M.; Universidad EAFIT. Departamento de Ciencias; Electromagnetismo Aplicado (Gema)
    Hydroxyapatite (HA) is a material widely used by the medical community due to its Ca/P ratio is comparable to the Ca/P ratio of bones and teeth, which promotes osteoinduction and osteoconduction processes when in contact with bone tissue, either as volume piece or coating. This work focuses on studying the quality of the commercial HA powder MKnano-#MKN-HXAP-S12 µm, after processing, to obtain sintered compact discs with suitable physical and chemical characteristics for implants applications. The HA powder was processed through calcination, grinding, pressing and sintering to evaluate the effect of such as procedures in the compacts dics quality. The raw powder was characterized by laser diffraction, SEM, XRF, XRD, TGA and DSC while the characteristics of the obtained compact discs were determined by dilatometry and XRD to identify the sintering temperature range, constituent phases, the amorphous content and the crystallinity degree, parameters that allow determining their suitability for implants applications. Although, it was not possible to obtain sintered compacts with the suitable chemical composition and without fractures, this work allowed to identify the parameters that determine the suitability of a HA powder to obtain sintered compacts for medical applications, as well as the characterization protocol that allows the evaluation of such parameters. © Published under licence by IOP Publishing Ltd.
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    Synthesis of Alumina Thin Films Using Reactive Magnetron Sputtering Method
    (IOP PUBLISHING LTD, 2017-06-13) Angarita G.; Palacio C.; Trujillo M.; Arroyave M.; Angarita G.; Palacio C.; Trujillo M.; Arroyave M.; Universidad EAFIT. Departamento de Ciencias; Electromagnetismo Aplicado (Gema)
    Alumina (Al2O3) thin films were deposited on Si (100) by Magnetron Sputtering in reactive conditions between an aluminium target and oxygen 99.99% pure. The plasma was formed employing Argon with an R.F power of 100 W, the dwelling time was 3 hours. 4 samples were produced with temperatures between 350 and 400 °C in the substrate by using an oxygen flow of 2 and 8 sccm, the remaining parameters of the process were fixed. The coatings and substrates were characterized using Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM), X-ray diffraction (XRD) and Energy Dispersive Spectroscopy (EDS) in order to compare their properties before and after deposition. The films thicknesses were between 47 and 70 nm. The results show that at high oxygen flow the alumina structure prevails in the coatings while at lower oxygen flow only aluminum is deposited in the coatings. It was shown that the temperature increases grain size and roughness while decreasing the thicknesses of the coatings. © Published under licence by IOP Publishing Ltd.